GE Water & Process Technologies, a unit of General Electric Co. will invest 130 million (SGD) during the next 10 years to establish a world-scale GE Water & Process Technologies Global R&D Centre here.
Comprising five centers of excellence, this R&D complex will employ 100 top-tier researchers who will build up a full range of R&D capabilities and transform innovative concepts into products and solutions that will address real-world demands.
“Our decision to invest in Singapore is because of the strong commitment from the government in developing the water industry,” said Jeff Garwood, President and CEO of GE Water & Process Technologies. “This, coupled with the easy availability of skilled manpower and the strong enforcement of intellectual property rights regulations, makes Singapore the ideal platform to launch this R&D center.”
Hosted at the National University of Singapore (NUS), the research center will leverage on the university’s comprehensive research infrastructure in engineering, science and medicine.
“NUS is privileged to be chosen to host GE Water’s R&D Center,” said Professor Shih Choon Fong, president of the National University of Singapore. “I see this initiative facilitating interaction between GE’s leading scientists and our researchers and students, enhancing the vibrancy of our research environment and capabilities.”
The center will conduct research aimed at alleviating pressing water issues, related to quality, availability and the affordability of safe, usable water supplies. Specific areas of research include water treatment and systems integration, fundamental chemical and membrane applications and ion-exchange technology.
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